Study of etching bias modeling and correction strategies for compensation of patterning process effects : Nanolithography 2012NG, Philip C. W; TSAI, Kuen-Yu; MELVIN, Lawrence S et al.Microelectronic engineering. 2013, Vol 110, pp 147-151, issn 0167-9317, 5 p.Conference Paper

Full-chip high resolution electron-beam lithography proximity effect correction modelingISOYAN, Artak; MELVIN, Lawrence S.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7637, issn 0277-786X, isbn 978-0-8194-8051-4 0-8194-8051-7, 76370X.1-76370X.9Conference Paper

32nm Half Pitch Node OPC Process Model Development for Three Dimensional Mask Effects Using Rigorous SimulationMELVIN, Lawrence S; SCHMOELLER, Thomas; JIANLIANG LI et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67304I.1-67304I.7, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Rapid search of the optimum placement of assist feature to improve the aerial image gradient in iso-line structureJIANLIANG LI; QILIANG YAN; MELVIN, Lawrence S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65204A.1-65204A.7, issn 0277-786X, isbn 978-0-8194-6639-6Conference Paper

Process model quality assessment by sensitivity analysisQILIANG YAN; MELVIN, Lawrence S; SHIELY, James P et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-5853-8, 2Vol, Part 2, 686-692Conference Paper

Etch analysis of patterns to comprehend manufacturabilityBEALE, Daniel F; MELVIN, Lawrence S.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6358-2, vol 2, 62832T.1-62832T.7Conference Paper

Detecting focus-sensitive configurations during OPCMELVIN, Lawrence S; SHIELY, James P; QILIANG YAN et al.SPIE proceedings series. 2005, pp 255-261, isbn 0-8194-5736-1, 7 p.Conference Paper

Stepwise fitting methodology for Optical Proximity Correction modelingISOYAN, Artak; JIANLIANG LI; MELVIN, Lawrence S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764030.1-764030.4, 2Conference Paper

The use of optical proximity correction to compensate for reflectivity differences in N type and P type poly- siliconMELVIN, Lawrence S; JENSHENG HUANG.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 61561F.1-61561F.7, issn 0277-786X, isbn 0-8194-6199-7, 1VolConference Paper

The use of process models to enhance device performance through semiconductor designMELVIN, Lawrence S; ZHANG, Daniel.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 61560J.1-61560J.8, issn 0277-786X, isbn 0-8194-6199-7, 1VolConference Paper

Flare mitigation strategies in extreme ultraviolet lithographyKIM, Insung; MYERS, Alan; MELVIN, Lawrence S et al.Microelectronic engineering. 2008, Vol 85, Num 5-6, pp 738-743, issn 0167-9317, 6 p.Conference Paper

Model-based placement and optimization of sub-resolution assist featuresBARNES, Levi D; PAINTER, Benjamin D; MELVIN, Lawrence S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, issn 0277-786X, isbn 0-8194-6197-0, vol 2, 61542C.1-61542C.7Conference Paper

Identification of sub-resolution assist features that are susceptible to imaging through processMELVIN, Lawrence S; DRAPEAU, Martin; JENSHENG HUANG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 63491Q.1-63491Q.8, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

Building bulk-resist model for image formation in chemically amplified resists at EUVPATHAK, Piyush; QILIANG YAN; SCHMOELLER, Thomas et al.Microelectronic engineering. 2009, Vol 86, Num 4-6, pp 787-791, issn 0167-9317, 5 p.Conference Paper

Modelling strategies for the incorporation and correction of optical effects in EUVLPATHAK, Piyush; QILIANG YAN; SCHMOELLER, Thomas et al.Microelectronic engineering. 2009, Vol 86, Num 4-6, pp 500-504, issn 0167-9317, 5 p.Conference Paper

Resist Bias Measured in Iso-focal StructureJIANLIANG LI; CHUNQING WANG; KAZARIAN, Aram et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692449.1-692449.8, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Three Dimensional Mask Effects in OPC Process Model Development From First Principles SimulationMELVIN, Lawrence S; SCHMOELLER, Thomas; KALUS, Christian K et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 679207.1-679207.8, issn 0277-786X, isbn 978-0-8194-6956-4Conference Paper

Lithography window check before mask tape-out in sub 0.18um technologyLU, Mark; KING, Dion; LI, Flora et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 61560X.1-61560X.8, issn 0277-786X, isbn 0-8194-6199-7, 1VolConference Paper

Multi-layer Model vs. Single-layer Model for N and P Doped Poly Layers in Etch Bias ModelingJIANLIANG LI; VIDAL-RUSSELL, Ezequiel; BEALE, Daniel et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78233V.1-78233V.9, 2Conference Paper

A 45° dual dipole decomposition scheme to improve image fidelityBISWAS, Abani M; HISEROTE, Jay A; JIANLIANG LI et al.Microelectronic engineering. 2007, Vol 84, Num 5-8, pp 694-699, issn 0167-9317, 6 p.Conference Paper

Improvement of model kernel representation in process simulation by taking pattern correlation into accountJIANLIANG LI; QILIANG YAN; MELVIN, Lawrence S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65330N.1-65330N.6, issn 0277-786X, isbn 978-0-8194-6655-6Conference Paper

OPC Verification on Cell Level Using Fully Rigorous Mask Topography SimulationDOMNENKO, Vitaliy; KLIMPEL, Thomas; VIEHOEVER, Georg et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 67304J.1-67304J.10, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Assist feature placement analysis using focus sensitivity modelsMELVIN, Lawrence S; MAYHEW, Jeffrey P; PAINTER, Benjamin D et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810X.1-62810X.7, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

Line end design intent estimation using curvesHUNG, Chi-Yuan; GENSHENG GAO; ZHANG, Steven et al.SPIE proceedings series. 2005, pp 413-418, isbn 0-8194-5736-1, 6 p.Conference Paper

Abbe-PCA-SMO: Microlithography Source and Mask Optimization Based on Abbe-PCACHANG, Jason Hsih-Chie; CHEN, Charlie Chung-Ping; MELVIN, Lawrence S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764026.1-764026.10, 2Conference Paper